Custom AR Coatings
for Laser Crystals
Custom AR coating service for solid-state laser crystals and optical gain media. We provide single-wavelength, dual-band, broadband, and low-loss antireflection coatings optimized for high-power and ultrafast laser applications. Available for Nd:YAG, Yb:YAG, Ti:Sapphire, Cr:YAG, Alexandrite, YVO₄, LBO, BBO, sapphire, quartz, and custom optical substrates. Capabilities include: • Low-reflectance AR coatings (<0.2% typical) • Dual-side and wavelength-selective designs • High damage threshold coatings for pulsed lasers • UV, visible, NIR, and mid-IR wavelength ranges • Custom coating stacks for research and OEM systems • Small prototype quantities to volume production
at design wavelength
UV to mid-IR
at center design
1064 nm, 10 ns, 10 Hz
transmitted (P-V)
circular & rectangular
Single-Wavelength AR
Ultra-low reflectance at a single target wavelength. Ideal for CW oscillators and fixed-frequency Q-switched systems requiring maximum extraction efficiency.
R < 0.1% typicalDual-Band AR
Simultaneous low reflectance at pump and emission wavelengths. Common configurations: 808/1064 nm, 940/1030 nm, 532/1064 nm for intracavity-doubled systems.
R < 0.3% per bandBroadband AR (BAR)
Low reflectance across a continuous waveband. Engineered for ultrafast Ti:Sapphire and Yb-doped systems with broad gain bandwidth or tunable operation.
R < 0.5% avg over bandV-Coat (High-Performance)
Steep-slope V-shaped reflection curve minimizing reflectance at a precise wavelength with high angular tolerance. Suitable for OPO crystals and etalon surfaces.
R < 0.05% at design λAngled-Surface AR
Custom designs for Brewster-cut or wedged crystals where the coating is optimized for the actual angle of incidence rather than normal incidence.
AOI 0°–65°AR + HR Combo
Input coupler and output coupler coatings on opposite faces of the same crystal element, eliminating additional intracavity surfaces and etalon effects.
Monolithic cavity designDesign & simulation
Thin-film stack design using OptiLayer / TFCalc. Refractive index dispersion models matched to substrate material. Optimization for reflectance, transmission, group delay, and LIDT simultaneously.
Substrate preparation
Ultrasonic cleaning, solvent rinse cascade, UV-ozone treatment. Surface inspection to MIL-PRF-13830B scratch-dig specification prior to loading. Vacuum bake to remove adsorbed moisture.
Ion-assisted deposition (IAD)
E-beam evaporation with in-situ ion bombardment for dense, low-absorption films. Layer thickness monitored by optical quartz crystal microbalance and in-situ reflectance at control wavelength.
Post-deposition anneal
Controlled thermal treatment to relieve film stress and improve adhesion. Applied where compatible with substrate material and coating design.
Metrology & acceptance test
Spectrophotometer verification of R and T across full wavelength range. Wavefront measurement (Zygo interferometry). LIDT test available on request per ISO 21254. Full data report issued with shipment.
Custom coating
specification request
Provide your substrate material, dimensions, wavelength(s), angle of incidence, and power handling requirements. Our engineers will respond within 2 business days with a design feasibility assessment and quote.